Ge Single crystal substrate, N-type Undoped (100) +/-2.5 Degree, 10x10x0.5mm, 1sp, R: >50 ohm.cm Milling Jars Gold layer thickness: 50nm (+/-

Gold layer thickness: 50nm (+/- 5nm)

Voltage upper & lower limit

polymer battery with tab:

Size:                                10x3 x 0

Ge Single crystal substrate, N-type Undoped (100) +/-2.5 Degree, 10x10x0.5mm, 1sp, R: >50 ohm.cm Milling Jars Gold layer thickness: 50nm (+/-Specifications Growing Method: CZ Wafer Size: 10x10x0. 5 mm Surface Polishing: one side epi polished Orientation: (100)+ 2. 5 Degree Surface roughness: RMS or Ra:~ 10 A(By AFM) Doping: Undoped Conductor type: N type Resistivity: > 50 Ohms cm (If you would like to measure the resistivity accurately, please order our Portable 4 Probe Resistivity Testing Instrument.) Package: under 1000 class clean room in wafer container Related Product Other Crystal