85% @ 555nm Related Products Thin Films A Z Crystal wafer A Z Plasma Cleaner Wafer Containers Dicing saw Film Coater"> 85% @ 555nm Related Products Thin Films A Z Crystal wafer A Z Plasma Cleaner Wafer Containers Dicing saw Film Coater"> 85% @ 555nm Related Products Thin Films A Z Crystal wafer A Z Plasma Cleaner Wafer Containers Dicing saw Film Coater"> ITO Coated Glass Substrate 1" x 1" x 1.1 mm, R: 16-19 ohm/sq, Nominal ITO film thickness: 90 nm+/10nm Hot Phi (work function): 4 – digilifeset.online

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ITO Coated Glass Substrate 1" x 1" x 1.1 mm, R: 16-19 ohm/sq, Nominal ITO film thickness: 90 nm+/10nm Hot Phi (work function): 4

$17.19

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Phi (work function): 4

which can maintain chemical powder during tube rotating

An optional tube rack for 15ml x 16 centrifuge tubes is available at extra cost

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ITO Coated Glass Substrate 1" x 1" x 1.1 mm, R: 16-19 ohm/sq, Nominal ITO film thickness: 90 nm+/10nm Hot Phi (work function): 4Indium Tin Oxide (ITO) coated Glass Plates Dimension: 1" x 1" x 1. 1 mm Resistivity: 16 19ohm sq Nominal ITO film thickness: 90 nm+ 10nm Optical Transparency: > 85% @ 555nm Related Products Thin Films A Z Crystal wafer A Z Plasma Cleaner Wafer Containers Dicing saw Film Coater

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