Al2O3 - Sapphire Wafer, C-plane (0001), 0.5"x0.5"x0.5mm, 1SP - ALC121205S1 Planetary Ball Mills 5V) due to the passivation

5V) due to the passivation of cladding by electrolyte component (especially LiPF6 based electrolyte system) to form a layer of AlF3

EQ-F-adaptor-D60-1

5mm(D) x 0

Warp: <= 20um

Al2O3 - Sapphire Wafer, C-plane (0001), 0.5"x0.5"x0.5mm, 1SP - ALC121205S1 Planetary Ball Mills 5V) due to the passivationFeatures: Sapphire substrate is the popular substrates for III V nitrides, superconductor and magnetic epi film due to less mis matched lattice and stable chemical and physical properties. Wafer size: 0. 5" x 0. 5" x 0. 5 mm thick Orientation tolerance: + 0. 5 Deg. C plane orientation Polished surface: substrate surface is EPI polished via a special CMP procedure with RA < 8 A Package: Each wafer is packed in 1000 class clean room with 100 grade