P01600 - SEMI P16 - 黒鉛炉原子吸光分光法によるポジティブフォトレジスト・メタルイオンフリー（MIF）現像液中の錫の測定 StdVol-Gases 3 This Test Method measures

3  This Test Method measures the flatness of the front wafer surface as it would appear relative to a specified reference plane when the back surface of the water is ideally flat

device makers

SEMI E171-0914 (first published)

本スタンダードは，global Gases Technical Committeeで技術的に承認されている。現版は2000年12月20日，global Audits and Reviews Subcommitteeにて発行が承認された。2001年1月にwww

P01600 - SEMI P16 - 黒鉛炉原子吸光分光法によるポジティブフォトレジスト・メタルイオンフリー（MIF）現像液中の錫の測定 StdVol-Gases 3 This Test Method measuresNOTICE: This translation is a REFERENCE COPY ONLY. If differences should exist between the English version and a translation in any other language, the English version is the official and authoritative version. SEMI SEMI Global Micropatterning CommitteeNorth American Microlithography Committee2004711North American Regional Standards Committee20049www. semi. org2004111992 NOTICE: This Standard or Safety Guideline has an Inactive Status because the