Silicon Nitride Film (LPCVD) on Corning 7980, Film thickness: 1.3um Max. current +2 A 5 (mm3) ( 4

5   (mm3)  ( 4

two high-temperature silicone O-rings ( 300oC Max

KF25 to KF16 reducer union plays as an adapter when customer connects MTI's high vacuum pump

Optional:    Rotating heater with speed (0 - 5 RPM) is available upon request at extra cost

Silicon Nitride Film (LPCVD) on Corning 7980, Film thickness: 1.3um Max. current +2 A 5 (mm3) ( 4Silicon Nitride Film Si3N4 Film coated by low stress LPCVD method Si3N4 Thickness: 1. 3um + 5% Si3N4 covers both sides on Corning 7980 0F fused silica ( Warning: the Si3N4 film may have stressed induced microcracking resulted from the large difference of thermal expansion coefficient between Si3N4 and SiO2 fused silica ) Nitride Thickness: 13000 Angstroms + 5% Nitride Ref Index : 2. 30 + 0. 05 UV Grade Fused Silica (Corning 0F 7980 HPFS) Size: 100. 0