P02800 - SEMI P28 - Specification for Overlay-Metrology Test Patterns for Integrated-Circuit Manufacture StdTpc-Cluster Tools The calibration method is defined

The calibration method is defined in SEMI M53

The limit of detection is determined by either the BLANK value or by count rate limitations

optical characteristics (single transmittance

but controlled

P02800 - SEMI P28 - Specification for Overlay-Metrology Test Patterns for Integrated-Circuit Manufacture StdTpc-Cluster Tools The calibration method is definedThis standard was technically approved by the global Micropatterning Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on April 25, 2007. It was available at www. semi. org in June 2007. Originally published in 1996. NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available