M03300 - SEMI M33 - Test Method for the Determination of Residual Surface Contamination on Silicon Wafers by Means of Total Reflection X-Ray Fluorescence Spectroscopy (TXRF) Revision:SEMI M33-0998 (Withdrawn 1107) - Withdrawn - Historical SEMI E40-0705E (editorial revision)

SEMI E40-0705E (editorial revision)

This Specification covers ordering information and certain requirements for single crystal silicon wafer and cast silicon wafer for PV applications

基線製程

Resistivity is a primary quantity for characterization and specification of material used for semiconductor electronic devices

M03300 - SEMI M33 - Test Method for the Determination of Residual Surface Contamination on Silicon Wafers by Means of Total Reflection X-Ray Fluorescence Spectroscopy (TXRF) Revision:SEMI M33-0998 (Withdrawn 1107) - Withdrawn - Historical SEMI E40-0705E (editorial revision)This standard was technically approved by the global Silicon Wafer Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on September 5, 2007. It was available at www. semi. org in October 2007. Originally published September 1998. NOTICE: This document was balloted and approved for withdrawal in 2007. The test provides the analytical procedure to determine the trace level of contaminating elements of an